European Tender Electron Beam Lithography system
Opportunity Score
Why this score?
Opportunity
60 / 100
Complexity
40 / 100
Risk factors
Important procurement documents (e.g., technical specifications, terms of contract) are not analyzed. Key details about...
Eligibility and award criteria are not disclosed in the notice, making it difficult to assess qualification and evaluat...
Deep Portfolio Analysis
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- Description
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Overview
Moderate opportunityKey Facts
- EUR 3.5M estimated value
- Supplies contract
- 1 lot
- Purchase of an Electron Beam Lithography system
- High resolution and high speed patterning
Show full summary
The University of Twente (MESA+ Institute) is procuring an Electron Beam Lithography system via an open procedure. The system must provide high resolution and high speed patterning on substrates up to 200mm. The tender value is €3,500,000 EUR. Submission deadline is 2026-08-14T10:00:00 UTC. The tender is conducted in English and electronic submission is allowed. No eligibility or award criteria are provided in the notice, and procurement documents have not been analyzed.
Risks
Important procurement documents (e.g., technical specifications, terms of contract) are not analyzed. Key details about...
Eligibility and award criteria are not disclosed in the notice, making it difficult to assess qualification and evaluat...
Analysis may be incomplete
Only part of the procurement documentation was analyzed. Additional eligibility requirements, certificates, or submission documents may exist in the remaining tender documentation.
Key Requirements
Technical
- System must achieve high resolution and high speed
- Compatibility with a wide range of applications and substrate types
- Must support substrates up to 200mm in diameter
Requirements may be incomplete.
Buyer
Name
Universiteit Twente
Location
Enschede, NLD
Website
Buyer profile
Identifier
50130536
Lots (1)
LOT-0000
European Tender Electron Beam Lithography system
Supply of one Electron Beam Lithography system for the MESA+ Institute. System must be suitable for defining patterns in electron sensitive resists at high resolution and high speed, compatible with substrates up to 200mm diameter, and usable by academic researchers, students, and industrial engineers.
EUR 3.5M
Estimated value
Location
Category
Deadline
Award details
Additional CPV codes
Value note
Show original TED data
Original TED description
The University of Twente is tendering to purchase an Electron Beam Lithography system. The MESA+ Institute of the University of Twente will invest in a new Electron Beam system (e-beam system). A system, suitable for defining patterns in electron sensitive resists, at high resolution and high speed, compatible with a wide range of applications and substrate types up to 200mm in diameter. The system will be used by a wide range of users, i.e. academic researchers and students as well as industrial engineers with different backgrounds (photonics, (nano)-electronics etc.) and different levels of expertise.
Procurement Details
- Publication date
- 14 Jun 2026
- Notice type
- Contract notice — standard
- Languages
- English
Reference metadata
- Notice subtype
- 16
- Notice version
- 1
- Legal basis
- 32014L0024
Reference IDs
- Tender ID
- 409508-2026
- Source notice ID
- d8072cd8-e497-49af-b432-8865f10c18de
Documents (1)
Similar tenders
Opportunity Score
Why this score?
Opportunity
60 / 100
Complexity
40 / 100
Risk factors
Important procurement documents (e.g., technical specifications, terms of contract) are not analyzed. Key details about...
Eligibility and award criteria are not disclosed in the notice, making it difficult to assess qualification and evaluat...
Deep Portfolio Analysis
Uses:
- Description
- Industries & Services
- Capabilities
- Market & Experience
- Certifications